risk for radiation damage
|
μ‐SRXRF
|
X‐rays
|
Multi‐element
|
>10 nm
|
1 nm
|
5 ppm
|
Yes
|
Very high
|
|
|
|
TXRF
|
X‐rays
|
Na‐U
|
|
>3 nm
|
|
Yes (Optional)
|
High
|
|
Polished surface required for best detection limits, Can analyze many substrates, e.g. Si, SiC, GaAs, InP, sapphire, glass
|
|
X‐ray fluorescence microscopy (XFM)
|
X‐rays
|
Multi‐element (Al‐U but poor 2nd row Z > 42
|
0.05–1 μm
|
>100 μm
|
<0.1 ppm
|
Yes
|
Medium
|
Upto 150 × 100
|
Ability for spectroscopy (XAS) to determine chemical speciation
|
|
SEM/TEM‐EDS
|
Electrons
|
Multi‐element (O‐U)
|
<0.5 μm
|
<0.5 μm
|
1000 ppm
|
Yes
|
Medium
|
7 × 7
|
Resolution depends on element investigated
|
|
PIXE
|
Protons (for biological applications)
|
Multi‐element (Na‐U)
|
2 μm
|
10–100 μm
|
1–10 ppm
|
Limited
|
Very high
|
4 × 4
|
Quantitative measurements of heavier elements that can't be resolved by RBS alone
|
|
XPS/ESCA
|
X‐rays
|
Li‐U (Chemical bonding information)
|
0.5 nm
|
3 nm
|
100 ppm
|
Yes
|
High
|
Smallest analytical area ~10 μm
|
Limited specific organic information and sample compatibility with UHV environment.
|
|
Auger (AES)
|
Electrons
|
Li‐U
|
0.2 μm
|
3 nm
|
100 ppm
|
Yes
|
High
|
Small area analysis (~20 nm minimum)
|
Analysis of insulators can be difficult and samples must be vacuum compatible.
|
|
SIMS
|
Ions
|
H‐U including isotopes
|
5 μm
|
0.1 nm
|
1 ppb
|
Yes
|
Medium
|
Small‐area analysis (1–10 μm)
|
Destructive,no chemical bonding information, and sample must be solid and vacuum compatible.
|
|
TOF‐SIMS
|
Ions
|
Full periodic table coverage, plus molecular species
|
<0.1 μm
|
1 nm
|
1 ppm
|
Yes
|
High
|
|
Samples must be vacuum compatible
|
|
RBS
|
He2+ Ions (alpha particles)
|
B‐U
|
2 mm
|
10–20 nm
|
1–1000 ppm
|
No
|
Medium
|
Large analysis area (~2 mm)
|
Non‐destructive, Conductor and insulator analysis
|
|
ICP‐OES
|
Argon plasma
|
Li‐U (except gases, halogens, low quantity of P and S)
|
No
|
Bulk chemical analysis technique
|
<1 ppb
|
No
|
Medium
|
No
|
C, H, N, O and halogens cannot be determined.
|
|
ICP‐MS
|
Plasma source
|
Most of the elements
|
No
|
No
|
Typically ng/ L
|
No
|
Medium
|
No
|
Polyatomic mass interferences, atmospherics and light halogens
|
|
LA‐ICP‐MS
|
Photos (Laser)
|
Multi‐element (Al‐U)
|
100 nm
|
0.1–1 μm
|
<1 ppb
|
Yes (Limited: ablated surface)
|
Medium
|
20 × 20
|
Elemental, stable isotope distribution analysis and mapping
|
|
LIBS
|
Photos (Laser)
|
All elements detectable
|
|
>0.1 μm
|
1 ppm
|
Yes (Limited)
|
Medium
|
|
Strong matrix‐effects on emission spectra
|
|
Atom Probe Tomography (APT)
|
Laser or voltage pulse
|
H‐U
|
<1 nm
|
0.3 nm
|
~10 ppm
|
Yes
|
High
|
50 × 50 nm2
|
Ability to identify isotopes, Cluster analysis for nanoscale precipitates
|
|
STEM
|
Electrons
|
B‐U (EDS)
|
3 nm
|
3 nm
|
Typically ppm
|
Yes
|
High
|
5 μm x 5 μm
|
